Enhancement of height resolution in direct laser lithography

TCAD development for lithography resolution enhancement

Advances in lithography have contributed significantly to the advancement of the integrated circuit technology. While nonoptical next-generation lithography (NGL) solutions are being developed, optical lithography continues to be the workhorse for high-throughput very-large-scale integrated (VLSI) lithography. Extending optical lithography to the resolution levels necessary to support today’s a...

Laser scanner for direct writing lithography.

A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 microm are presented.

Resolution enhancement optimization methods in optical lithography with improved manufacturability

Photopolymerization Inhibition Dynamics for Sub-Diffraction Direct Laser Writing Lithography

Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography-a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibitio...

Modelling of Resolution Enhancement Processes in Lithography - Microelectronics, 1995. Proceedings., 1995 20th International Conference on

This paper describes the modelling and simulation of two resolution enhancement techniques in lithography ; 1) phase shift mask (PSM) technology and 2) top surface imaging (TSI) with silylation and dry development. The effect of the duty ratio on the image contrast is computed. Simulated one and two dimensional rim shifters and attenuated PSMs are presented. The effect of the aerial image on th...